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运用薄膜技术在镍基弹性体上制备金属 -绝缘层 -金属 (MIM)结构的薄膜应变栅 ,测试了应变栅在 2 0 0～ 30 0℃的高温区内的稳定性 ,并分析了应变栅薄膜的结构、薄膜的应力以及热处理工艺等因素对力敏薄膜在高温下的稳定性的影响。
The thin film strain grid with metal-insulator-metal (MIM) structure was fabricated on the nickel-based elastomer by thin film technology. The stability of the strain grid at high temperature range of 200 ~ 300 ℃ was tested. The structure of the film, the stress of the film and the heat treatment process and other factors on the stability of the force-sensitive film at high temperature.