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本文描述了新型激光快速直写亚微米光刻系统。由准分子激光采用飞点扫描曝光的方法在片子上作图，制作了一种可编程相位调制的空间光学调制器（ＳＬＭ），使用具有反射的、可变（粘）弹性的反射层的ＣＭＯＳ有源矩阵，研究成功并生产了５１２×４６４象素ＳＬＭ。业已表明，０６μｍ最小特征尺寸的曝光装置，完成了由ＧＤＳＩＩＣＡＤ设计数据给出的整个光刻层曝光的全部功能要求；试验样机给出了质量很好的０６μｍ光刻图形。具有提高每小时数片１５０ｍｍ片子产量的激光快速直写装置样机正在设计之中。
This article describes the new laser direct write submicron lithography system. A novel programmable phase modulation space-based optical modulator (SLM) was fabricated by using an excimer laser flying-spot scanning exposure on a film. Using a CMOS with a reflective, variable (visco) elastic reflective layer Active matrix, successful research and production of 512 × 464 pixel SLM. It has been shown that an exposure device with a minimum feature size of 0.6 μm fulfills all the functional requirements of the entire lithography exposure given by the GDSIICAD design data; a good quality 0.6 μm lithography pattern is given by the test prototype. Prototypes are being designed for laser rapid writers that increase the throughput of 150mm films per hour.