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用金属铝靶射频反应溅射制备了Al2O3薄膜，用作LCD基片玻璃的钠离子阻挡层。报道了射频溅射参数对薄膜沉积速率和折射率的影响。测试结果表明，所沉积的Al2O3薄膜满足LCD器件阻挡层的要求。
The Al 2 O 3 thin films were prepared by radio frequency reactive sputtering from an aluminum target and used as a sodium ion barrier in LCD substrate glass. The effects of RF sputtering parameters on the film deposition rate and refractive index are reported. The test results show that the deposited Al2O3 film meets the requirements of the LCD device barrier layer.