By using n-butylamine as a carbon resource, carbon film is deposited on the p-n porous silicon (PS) surface with aradio-frequency glow discharge plasma system. Raman spectra and infrared reflection (IR) spectra of the carbonfilms indicate that there are amine-group and hydrogen atoms therein. The IR spectra of the passivated PSsamples exhibit that the PS surfaces are mainly covered with Si-C, Si-N and Si-O bonds. Electroluminescence(EL) spectra show that the EL intensity of the passivated PS diodes increases greatly and the blueshift of theEL peak occurs compared with the diodes without treatment. Both of these are stable while the passivateddiodes are exposed to the air indoors. The I-V characteristics reveal that the passivated diodes have a smallerseries resistance and a lower onset voltage. The influence of the carbon film passivation on EL properties of PShas also been discussed. The results have proven that carbon film passivation is a good way to enhance the PSluminescent intensity and stability.