论文部分内容阅读
利用非平衡磁控溅射设备,在溅射制备类石墨碳膜(GLC)时,通入C_2H_2气体引入化学气相沉积(CVD)制备改性GLC。使用划痕仪,显微硬度计,摩擦磨损机,X射线衍射和X射线光电子能谱,对改性GLC进行性能和结构分析,并且和溅射GLC进行了对比。结果发现:添加C_2H_2后的碳膜,非晶结构没有发生变化,但是膜内sp~3键含量增加。改性GLC碳膜硬度有所增加,具有良好的结合强度,碳膜硬度和摩擦性能得到提高。
Using unbalanced magnetron sputtering equipment, during the preparation of graphite-like carbon film (GLC) by sputtering, C 2 H 2 gas is introduced into the modified GLC by chemical vapor deposition (CVD). The properties and structure of the modified GLC were analyzed using a scratch tester, a microhardness tester, a tribometer, X-ray diffraction and X-ray photoelectron spectroscopy and compared with sputtered GLC. The results showed that the amorphous structure of carbon film did not change after addition of C_2H_2, but the content of sp ~ 3 in the film increased. Modified GLC carbon film hardness increased, with good bonding strength, carbon film hardness and friction properties are improved.