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利用离子束辅助沉积方法制备单层二氧化铪薄膜,对薄膜样品的折射率、吸收特性进行了研究。实验结果表明,薄膜特性与制备工艺参数有着密切的关系,沉积速率、烘烤温度、离子束流、氧气流量均对单层二氧化铪薄膜紫外光学特性有着不同程度的影响。实验分析了不同工艺因素对单层二氧化铪薄膜的影响,并且找到了在一定范围内的最佳工艺参数。针对可能对紫外波段造成较大散射吸收损耗的微观表面形貌,利用SEM分析了典型工艺因素对表面形貌的影响。
The single-layer hafnium dioxide thin film was prepared by ion beam assisted deposition method, and the refractive index and absorption characteristics of the thin film samples were studied. The experimental results show that the film properties are closely related to the preparation process parameters. The deposition rate, baking temperature, ion beam current and oxygen flow rate all have different effects on the UV optical properties of single-layer hafnium dioxide films. The effects of different process factors on the single-layer hafnium dioxide film were analyzed experimentally, and the best process parameters were found within a certain range. In view of the microscopic surface topography which may cause large scattering absorption loss in the UV band, the influence of typical process factors on the surface topography was analyzed by SEM.