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介绍了一种具有高工艺可控性特征的单晶硅表面亚微米结构阵列介电微球辅助激光-化学复合成型的方法,采用这种方法可以在单晶硅表面制备具有较好周期性和均一性的三维微结构阵列。分析并总结了微球直径、刻蚀时间及激光脉冲能量密度对结构成型的影响规律,根据时域有限差分模拟法和晶硅结晶及其化学刻蚀的基础理论,分析研究了微结构的成型机制,并以样品表面反射率为例,验证了利用不同工艺所制备出的微米结构阵列对其表面光学性能的调控作用。
A method of laser-chemical compounding assisted by single-crystal silicon submicron array dielectric microspheres with high process controllability is introduced. This method can be used to prepare single-crystal silicon surface with better periodicity and Homogeneous three-dimensional microstructure array. The influences of microsphere diameter, etching time and laser pulse energy density on the structure forming were analyzed and summarized. According to the finite difference time-domain simulation method and the basic theory of crystalline silicon and its chemical etching, the microstructure forming Mechanism, and the sample surface reflectance as an example to verify the use of different processes prepared microstructure array surface optical properties of its regulatory role.