环化聚异戊二烯-双叠氮型感光性高分子是一类应用广泛的负性光致抗蚀剂。关于它的光交联反应机理,许多人曾进行过研究,但是当这种具有三维网络结构的光交联聚合物完成其抗蚀使命后,怎样把它干净、彻底地从被涂表面去掉,是微细加工中急待解决的问题。常用的溶剂浸泡、高温加氧灼烧和等离子氧去胶法都存在着这样或那样的问题 Cyclized polyisoprene-diazide-based photosensitive polymers are a class of widely used negative photoresists. Many people have conducted research on the photocrosslinking mechanism of the photocrosslinking reaction. However, after the photocrosslinked polymer with the three-dimensional network structure fulfills its anticorrosive mission, it is cleanly and thoroughly removed from the surface to be coated, Is the urgent need to solve micro-processing issues. Common solvent soaking, high temperature oxygen burning and plasma oxygen stripping methods have one or more problems