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采用电化学阻抗测试技术(EIS)、Mott-Schottky方法对β相模型合金在Cl-溶液环境中形成的表面膜的稳定性和半导体特性进行研究.结果表明,Cl-浓度的增加,使β相表面膜形成和活化溶解的趋势均加剧,即表面膜的稳定性变差.原因在于Cl-浓度较低时,β相表面膜的半导体类型为P型,P型半导体膜是一种阳离子导体膜,Cl-很难通过迁移扩散的方式穿过表面膜.随着Cl-浓度的增大,β相表面膜的半导体类型转变为N型,N型半导体膜便于Cl-穿越膜层到达膜层底部,继续腐蚀金属并使表面膜发生破裂.
The stability and semiconducting properties of the surface films formed by the β-phase model alloy in Cl-solution were investigated by using electrochemical impedance spectroscopy (EIS) and Mott-Schottky method. The results show that the increase of Cl- The tendency of surface film formation and activation dissolution is aggravated, ie, the stability of the surface film is deteriorated due to the fact that the semiconductor type of the β-phase surface film is P-type when the Cl- concentration is low, and the P-type semiconductor film is a cation conductor film , Cl- is difficult to migrate through the surface film by migration and diffusion.With the increase of Cl- concentration, the semiconductor type of β phase surface film changes to N-type, N-type semiconductor film facilitates Cl- through the film to reach the bottom of the film , Continue to corrode the metal and rupture the surface film.