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采用不同的方法裁剪高定向热解石墨(HOPG),制备纳米尺寸的石墨条.首先,发现用聚焦离子束(镓离子)刻蚀高定向热解石墨,可以得到边缘整齐程度在几十纳米的石墨条,另外,用电子束曝光和反应离子刻蚀的工艺,可以得到最小尺寸为50nm的纳米石墨图型(nanosizedgraphitepattern,纳米尺寸的多层石墨结构).采用了三种不同的方案制备反应等离子刻蚀过程中需要的掩膜,分别是PECVD生长的SiO2掩膜,磁控溅射的方法生长的SiO2掩膜和PMMA光刻胶掩膜,并将三种方案的刻蚀结果做了对比.
Different methods were used to fabricate highly oriented pyrolytic graphite (HOPG) to prepare nano-sized graphite strips.Firstly, it was found that by etching the highly oriented pyrolytic graphite with focused ion beam (gallium ion), the edge regularity in tens of nanometers In addition, nanosized graphite nanosized graphene nanostructures (nanosized graphene graphites) with a size of 50 nm can be obtained by electron beam lithography and reactive ion etching.The three different schemes were used to prepare reaction plasmas The masks required for the etching process are the SiO2 mask grown by PECVD, the SiO2 mask grown by magnetron sputtering, and the PMMA photoresist mask, and the etching results of the three schemes are compared.