制作连续微透镜列阵中主要的问题就是浮雕的深度和浮雕面形的控制 ,已有的微透镜列阵制作方法不能很好地解决 ;本文提出了一种利用干法和湿法蚀刻结合在硅片上制作连续深浮雕微透镜列阵的新方法 ,得到了深度 40μm的微柱面和旋转抛物面微透镜列阵 The main problem in making continuous microlens array is the depth of embossing and the control of relief shape. The existing fabrication methods of microlens array can not be solved well. In this paper, a method of combining dry and wet etching A new method of making continuous deep relief microlens arrays on silicon wafers was developed. Microprojections with a depth of 40μm and a rotating parabolic microlens array