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一、概述本世纪六十年代末由于光敏抗蚀干膜(简称干膜)这种新型电子化工材料的问世,开拓了电子工业印制电路生产的新纪元,从而大大提高了印制电路密度、精度和可靠性,由此受到人们极大的重视。近年来,我国干膜的研制和应用也取得了较大的进展。无夕电影胶片厂和重庆东方红试剂厂水溶性干膜生产已达到小批量的规模。干膜应用工艺即图形电镀一蚀刻工艺也巳日趋完善。
First, an overview of the late 60s of this century due to photosensitive dry film (dry film) of this new electronic chemical materials come out, opened up a new era of printed circuit production of the electronics industry, which greatly improves the printed circuit density, accuracy And reliability, which received great attention by people. In recent years, China's dry film development and application has made great progress. Wuyi Film Factory and Chongqing Dongfanghong Reagent Factory water-soluble dry film production has reached the small batch size. Dry film application process that is a pattern of electroplating an etching process has also been maturing.