建立了无火焰原子吸收分光光度法对高纯水、高纯硅及硅表面二氧化硅薄膜中痕量钠的测定方法.在局部净化,严格的试剂提纯及操作的情况下,可以达到试剂及空白稳定,适宜测定高纯硅及硅表面二氧化硅薄膜中毫微克级的钠含量,对高纯水中的钠可直接测定到0.1毫微克/毫升,在停气状态下检出极限可达2×10~-(12)克钠.方法简便、快速、准确、灵敏,经大量的样品分析检验,本方法能满足大规模集成电路生产工艺中钠离子沾污的测定. A flame atomic absorption spectrophotometry method was developed for the determination of trace sodium in high purity water, high purity silica and silicon dioxide film on the surface of silica gel. Under the condition of local purification, strict reagent purification and operation, reagents and blank stability , Suitable for the determination of high purity silicon and silica surface silicon dioxide nanoscale sodium content of sodium in high-purity water can be directly measured to 0.1 ng / ml, the state of gas detection limit up to 2 × 10 ~ - (12) g sodium. The method is simple, rapid, accurate and sensitive. After a large number of sample analysis tests, this method can meet the requirement of sodium ion contamination in the manufacturing process of large scale integrated circuits.