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超导薄膜实现布图布线工艺是制备超导电子元件的必要步骤。报道了两种二硼化镁超导薄膜布图布线的湿法刻蚀技术:一种是先利用双氧水(H2O2)刻蚀前驱体硼薄膜,然后将刻蚀的样品放入钽坩埚中在镁蒸气下高温退火,实现了对超导薄膜二硼化镁(MgB2)布图布线的刻蚀;另一种是选用氢氟酸(HF)和硝酸(HNO3)的混合溶液直接在二硼化镁超导薄膜上进行图形刻蚀。通过上述两种方法刻蚀出的MgB2薄膜图形精确度高,超导转变温度Tc都在38K以上,临界电流Ic约为1×106 A/cm2。
Superconducting thin film to achieve layout wiring process is necessary to prepare superconducting electronic components. Reported two kinds of magnesium diboride superconducting thin film wiring layout wet etching technology: one is the first use of hydrogen peroxide (H2O2) precursor boron film etching, and then the sample was etched tantalum crucible in magnesium Steam annealing under high temperature, to achieve superconducting thin film magnesium diboride (MgB2) layout wiring etching; the other is the choice of hydrofluoric acid (HF) and nitric acid (HNO3) mixed solution directly in the magnesium diboride Superconducting thin film on the graphics etching. The MgB2 films etched by the above two methods have high pattern accuracy, the superconducting transition temperature Tc is above 38K, and the critical current Ic is about 1 × 10 6 A / cm 2.