Effect of lateral structure parameters of SiGe HBTs on synthesized active inductors

来源 :Chinese Physics B | 被引量 : 0次 | 上传用户:haq1227
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The effect of lateral structure parameters of transistors including emitter width, emitter length, and emitter stripe number on the performance parameters of the active inductor(AI), such as the effective inductance Ls, quality factor Q,and self-resonant frequency ω_0 is analyzed based on 0.35-μm Si Ge Bi CMOS process. The simulation results show that for AI operated under fixed current density JC, the HBT lateral structure parameters have significant effect on Ls but little influence on Q and ω_0, and the larger Ls can be realized by the narrow, short emitter stripe and few emitter stripes of Si Ge HBTs. On the other hand, for AI with fixed HBT size, smaller JCis beneficial for AI to obtain larger Ls, but with a cost of smaller Q and ω_0. In addition, under the fixed collector current IC, the larger the size of HBT is, the larger Ls becomes, but the smaller Q and ω_0 become. The obtained results provide a reference for selecting geometry of transistors and operational condition in the design of active inductors. The effect of lateral structure parameters of transistors including emitter width, emitter length, and emitter stripe number on the performance parameters of the active inductor (AI), such as the effective inductance Ls, quality factor Q, and self-resonant frequency ω_0 based on 0.35-μm SiGe Bi CMOS process. The simulation results show that for AI operated under fixed current density JC, the HBT lateral structure parameters have significant effect on Ls but little influence on Q and ω_0, and the larger Ls can be realized by the narrow, short emitter stripe and few emitter stripes of Si Ge HBTs. On the other hand, for AI with fixed HBT size, smaller JCis beneficial for AI to obtain larger Ls, but with a cost of smaller Q and ω_0. , the fixed collector current IC, the larger the size of HBT is, the larger Ls becomes, but the smaller Q and ω_0 become. The obtained results provide a reference for selecting geometry of transistors and operational conditions i n the design of active inductors.
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