论文部分内容阅读
对Fe-Si-C合金中的脱溶沉淀过程已有人作过研究,但某些细节尚需继续加以探明,为此利用薄膜透射电子显微术和选区电子衍射技术作了进一步的研究。所用试验合金是在工业上广泛应用的3％Si-Fe合金,实际成分(wt-％)为: C Si Mn S P Cu Cr Ni Fe0.018 3.06 0.10 0.013 0.009 0.06 0.03 0.03 余量电镜薄膜试样在0.25mm厚的冷轧带材上截取;在干纯H_2保护下900℃1h固溶处理后,继以不同温度和时间的时效后水淬;经机械抛光—化学抛光—电解抛光制成薄膜,供透射电镜观察用。
Some studies have been done on the desolventization and precipitation in Fe-Si-C alloys. However, some details need to be further elucidated. For this purpose, further studies on thin-film transmission electron microscopy and selected area electron diffraction have been carried out. The test alloy used is a 3% Si-Fe alloy widely used in industry. The actual composition (wt-%) is: C Si Mn SP Cu Cr Ni Fe 0.018 3.06 0.10 0.013 0.009 0.06 0.03 0.03 Balance Electron Microscope Film Specimen 0.25mm thick cold-rolled strip taken on; in pure H_2 protection 900 ℃ 1h solution treatment, followed by different temperature and time after the water quenching; mechanical polishing - chemical polishing - electrolytic polishing film, For TEM observation.