一、前言薄膜及表面层的真空沉积可用物理汽相沉积(PVD)、化学汽相沉积(CVD)或表面反应及这些基本原理的组合应用来实现。为了获得有关膜生长的基本过程和原理,科学工作者对膜的形成、应用作出努力和探索。自从Langmuir和其他先驱者研究表面薄膜工艺以来,为了达到应用薄膜的目的和改善材料及产品质量,采用真空沉积是一种通用方法,该技术的应用集中于一些特殊工业部门,如:光学和电子元件的制造 I. Preface Vacuum deposition of thin films and surface layers can be achieved by physical vapor deposition (PVD), chemical vapor deposition (CVD) or surface reaction and a combination of these basic principles. In order to obtain the basic process and principle of membrane growth, scientists have made efforts and exploration on the formation and application of membranes. Since Langmuir and other pioneers have studied surface film processes, vacuum deposition has been a common approach for film application and material and product quality, and its application is focused on a few specialized industries such as optics and electronics Manufacturing of components