据报道,美国贝尔实验室最近已研究了一种更简单更经济的双极性集成电路制造技术,称为“三次掩蔽”(英文缩写“TRIM”)技术。采用这种新技术来制造集成电路只须 According to reports, the United States Bell Laboratories has recently studied a more simple and more economical manufacturing technology of bipolar integrated circuits, known as the “three masks” (abbreviation “TRIM ”) technology. Only use this new technology to make integrated circuits