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从半导体激光诱导液相腐蚀的工艺原理出发,对影响刻蚀精度的主要因素进行了分析研究,从刻蚀图像分辨率、侧壁垂直度及底面平坦度、表面均匀化三个方面提出了改善刻蚀精度的方法。
Based on the principle of semiconductor laser-induced liquid phase etching, the main factors influencing the etching accuracy are analyzed and studied. The improvement of etching resolution, sidewall verticality, bottom flatness and surface homogenization are proposed Etching accuracy of the method.