由E.W.Mller发明的场离子显微镜(Field Ion Microscope,FIM)已成为目前研究金属以及某些半导体表面的原子排列及其缺陷的一种极为重要的表面分析手段。关于FIM的基本原理、结构和参量,我们在资料中已介绍过,在本讲座中不再赘述。直到六十年代中期,FIM实验研究中的一个很重要的问题没能很好地得到解决,那就是,每当发现FIM像中出现一些特别明亮的异常像点时,尽管根据经验知道它们是一些异种原子或吸附的杂质原子,但无法具体知道它们究竟是什么原子。为了解决这个问题, The Field Ion Microscope (FIM) invented by E. W. Mller has become an extremely important surface analysis method for studying the atomic arrangement and defects of metals and some semiconductor surfaces. FIM on the basic principles, structure and parameters, we have described in the information, in this lecture will not repeat them. Until the mid-1960s, a very important problem in FIM experimental research was not well solved, that is, whenever some particularly bright anomalous pixels were found in FIM images, though they were known empirically to be some Heterogeneous atoms or adsorbed impurity atoms, but can not know exactly what they are atoms. To solve this problem,